CLUSTER FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To produce hyperfine particles of several nm order for a long time under stable conditions. SOLUTION: A target holder 1O inserted with a cylindrical target T is held between a vacuum flange 31 and a coupling 32 via insulating members 21 to 24. Sputtering gas G is fed from an introducing hole 33 in the coupling 32, and the target T is applied with discharge voltage to generate sputtering vapor. On the outlet side of the target T, carrier gas C is jetted toward the target T from concentrically formed many jetting holes 37. The generated sputtering vapor is converged by the carrier gas C to form into a jet flow and is transferred to a vapor depositing area.