发明名称 |
Composition for polishing a composite of silica and silicon nitride |
摘要 |
A composition is provided for polishing a composite comprised of silica and silicon nitride comprising: an aqueous medium, abrasive particles, a surfactant, and a compound which complexes with the silica and silicon nitride wherein the complexing agent has two or more functional groups each having a dissociable proton, the functional groups being the same or different.
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申请公布号 |
US6042741(A) |
申请公布日期 |
2000.03.28 |
申请号 |
US19980037668 |
申请日期 |
1998.03.10 |
申请人 |
RODEL HOLDINGS, INC. |
发明人 |
HOSALI, SHARATH D.;SETHURAMAN, ANANTHA R.;WANG, JIUN-FANG;COOK, LEE MELBOURNE |
分类号 |
B24B37/00;C03C19/00;C09K3/14;H01L21/304;H01L21/3105;(IPC1-7):C09K13/00;C09K13/06 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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