发明名称 POLISHING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a polishing composition showing a high polishing rate, providing good polish quality, and foaming little during being handled. SOLUTION: This composition comprises an abrasive, a polycarboxylic acid type polymer having carboxyl groups and polyalkylene oxide structures as side chains and an antifoam. The composition provides a high polishing rate, and a high working efficiency, causes surface defects little, provides excellent dimensional accuracy, foams little during use, and is suited for various precision polishing operations.
申请公布号 JP2000087010(A) 申请公布日期 2000.03.28
申请号 JP19980259849 申请日期 1998.09.14
申请人 DENKI KAGAKU KOGYO KK 发明人 KOBAYASHI AKIRA;SHIMIZU HIROAKI
分类号 B01D19/02;C08F222/06;C08F290/06;C08L55/00;C09K3/14;(IPC1-7):C09K3/14 主分类号 B01D19/02
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