| 发明名称 |
Method of cleaning CVD cold-wall chamber and exhaust lines |
| 摘要 |
A method of cleaning post deposition deposits from a processing chamber by providing a chlorine gas (Cl2), forming chlorine radicals and reacting the chlorine radicals with the deposits.
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| 申请公布号 |
US6042654(A) |
申请公布日期 |
2000.03.28 |
| 申请号 |
US19980006463 |
申请日期 |
1998.01.13 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
COMITA, PAUL B.;FORSTNER, HALI J. L.;RANGANATHAN, REKHA |
| 分类号 |
B01J3/00;B01J19/00;C23C16/44;H01L21/205;(IPC1-7):C03C23/00;B08B5/04 |
主分类号 |
B01J3/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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