| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject new compound comprising a specific photoresist monomer, having excellent adhesiveness and sensitivity, having no odor, not using a complicated separating means, being readily synthesized, mass producible at a low production unit cost. SOLUTION: This compound is shown by the formula (R is a 1-10C alkyl or the like; X and Y are each CH2, CH2CH2 or the like; and (i) is 0-2) such as 5-norbornene-2-carboxylic acid-3-hydroxyethylcarboxylate. The compound of the formula is obtained by reacting by adding a dialcohol compound (preferably ethylene glycol, 1,3-propanediol, etc.), to an organic solvent (preferably tetrahydrofuran, etc.), adding a base (preferably NaH, KH, etc.), or an acid catalyst (preferably sulfuric acid, acetic acid, etc.), to the formed solution, stirring the mixture to give a solution and reacting the solution with an anhydride compound (preferably 5-norbornene-2,3-dicarboxylic anhydride, etc.). |
