METHODE FOR MANUFACTURING SEMICONDUCTOR AND PROCESSING DEVICE

摘要

PURPOSE: A method for manufacturing a semiconductor and a processing device is provided to improve a finishing work by introducing a surface activation process for a finishing stone. CONSTITUTION: The method for manufacturing a semiconductor and a processing device comprises the steps of: performing a surface activation process to separate stone powder(23) on a finishing stone(16); contacting a brush(21) on the finishing stone when performing the surface activation process; performing the surface activation process of the finishing stone(16) by transferring an ultrasonic wave or a sound wave of 10 or more KHz to the finishing stone(16); and detecting a finishing state and controlling a condition of the surface activation process according to the detected value.