| 摘要 |
PURPOSE: A new polymer and photoresist compound having the polymer is provided, which can to be effectively imaged in a short wavelength such as a 248nm and a 193nm. CONSTITUTION: The photoresist compound comprises: a resin bonding agent including a polymer having an ester group repetition unit; and a photosensitive active component, wherein the ester group has a carbonyl and a carboxyl oxygen atom, and a non-cyclic or a signal chain cyclic alkyl portion, having about five or more carbon atoms, which is voluntarily substituted, and the alkyl portion has two or more tertiary carbon atoms or the alkyl portion has six or more carbon atoms, or the alkyl portion has about five to twelve carbon atoms. Thereby, it is possible to has an excellent resolution and improve the reliability.
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