发明名称 |
SULFONILOXIM FOR i-LINE PHOTOSENSITIVE THICK ANTICORROSION FILM WITH HIGH SENSITIVITY |
摘要 |
PURPOSE: A sulfonyloxime for i-line photosensitive thick anticorrosion film with high sensitivity is provided to improve anticorrosion characteristic. CONSTITUTION: The composition comprises one or more chemical compound combinable by acid action, one or more chemical compound changing solubility by acid action, and one and more chemical compound generating acid in light exposure with 240 ¯ 390mm wave length and having water absorption coefficient less than 10. |
申请公布号 |
KR20000017347(A) |
申请公布日期 |
2000.03.25 |
申请号 |
KR19990033880 |
申请日期 |
1999.08.17 |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC. |
发明人 |
ASAKURADOSIKAGE;BLAIAREHARETEMUTE;DEREOKRISHUTOF |
分类号 |
H01L21/027;G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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