| 摘要 |
<p>A positive radiation-sensitive composition comprising a polymer whose solubility in an aqueous alkali solution increases by the action of an acid and a compound which generates an acid upon irradiation with a radiation, characterized in that the polymer is more susceptible to radiation-induced backbone cleavage than poly(methyl methacrylate); or a positive radiation-sensitive composition comprising an alkali-soluble polymer, a compound which has the effect of reducing the alkali solubility of the polymer and in which the effect is lessened or eliminated by the action of an acid, and a compound which generates an acid upon irradiation with a radiation, characterized in that the polymer is more susceptible to radiation-induced backbone cleavage than poly(methyl methacrylate). The composition is a high-sensitivity composition having such high resolution that patterns with a line width smaller than a quarter micrometre can be formed therefrom.</p> |
