WAFER PROCESSING REACTOR SYSTEM WITH PROGRAMMABLE PROCESSING PARAMETERS AND METHOD

摘要

A wafer processing reactor system for processing semiconductor wafers is provided. The system includes a controller which responds to recipe steps, each step having a duration of time Trecipe, and controls a plurality of process parameters within the reactor. The controller is configured to provide control signals to change the value of the process parameters at a plurality of time intervals T, and where T is less than Trecipe, thereby providing substantially smooth ramping of the value of the process parameters over the duration of Trecipe. Further, the controller is configured to permit the selection of start value, end value, and transition between values for a selected parameter within an individual recipe step.