| 发明名称 |
PROCESS FOR THE FORMATION OF OXIDE CERAMIC THIN FILM |
| 摘要 |
<p>A method of forming an oxide-ceramics film capable of controlling the amount of oxygen in the film and with little oxygen deficiency. At least one or more of the steps among a step of forming an amorphous film, a step of heating the amorphous film for crystallization, and a step of these heat processings to be conducted thereafter include a step of processing under an atmosphere including moisture.</p> |
| 申请公布号 |
EP0987218(A1) |
申请公布日期 |
2000.03.22 |
| 申请号 |
EP19990900357 |
申请日期 |
1999.01.19 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
QIU, HONG;SUMI, KOUJI;SHIMADA, MASATO;NISHIWAKI, TSUTOMU;HASEGAWA, KAZUMASA |
| 分类号 |
C23C18/12;H01L21/314;H01L21/316;H01L27/10;(IPC1-7):C01B13/14;H01L41/18;C01G25/00 |
主分类号 |
C23C18/12 |
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