发明名称 ACTIVE MATRIX SUBSTRATE AND MANUFACTURE THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To restrain a switching device from deteriorating in characteristics by a method wherein a first conductive material used for a gate wiring is not formed in a gate electrode region, and a gate electrode is formed of second conductive material whose surface morphology is smaller than that of the first conductive material. SOLUTION: A conductive thin film of Ta metal material is formed on the surface of an insulating substrate 1 of glass or the like and shaped into a conductive electrode 2 by patterning. A conductive thin film of Al metal material is formed and shaped into a gate wiring 3 by patterning. The gate wiring 3 formed of Al that is low in resistance and large in surface morphology is low in resistance, and the gate electrode 2 is not formed of Al of large surface morphology but formed of Ta of small surface morphology. By this setup, a switching device is hardly affected by the surface configuration of a gate wiring material and prevented from deteriorating in characteristics.</p>
申请公布号 JP2000082817(A) 申请公布日期 2000.03.21
申请号 JP19980250571 申请日期 1998.09.04
申请人 SHARP CORP 发明人 BAN ATSUSHI;MURAI ATSUTO;OKADA YOSHIHIRO
分类号 H01L29/786;G02F1/136;G02F1/1368;H01L21/336;(IPC1-7):H01L29/786 主分类号 H01L29/786
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