发明名称 |
Etching apparatus and method of etching a substrate |
摘要 |
A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to the etcher (10) so that the substrate (11) is suspended over the inner chamber (22). A recirculating system (29) is used to pass an etchant through a filter, into the inner chamber (22), across the substrate (11), into the collection chamber (17), and into a reservoir.
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申请公布号 |
US6039835(A) |
申请公布日期 |
2000.03.21 |
申请号 |
US19970929686 |
申请日期 |
1997.09.15 |
申请人 |
MOTOROLA, INC. |
发明人 |
MANGAT, PAWITTER JIT SINGH;SEESE, PHILIP ARMIN;DAUKSHER, WILLIAM JOSEPH |
分类号 |
C23F4/00;H01L21/00;H01L21/306;(IPC1-7):C23F1/08 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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