发明名称 Apparatus and method for determining porosity
摘要 The present invention is related to an apparatus and a non-destructive method for determining the porosity of an element, particularly a thin film, formed on a substrate, said substrate being positioned in a pressurized chamber, said chamber being at a predetermined pressure and at a predetermined temperature. According to this method a gaseous substance like e.g. toluene vapor is admitted in said chamber and after a predetermined period of time the porosity of the thin film is determined by means of at least on ellipsometric measurement. Particularly, the optical characteristics resulting from this in-situ ellipsometry are used to determine the amount of gaseous substance condensed in the pores of the film. These amounts are used to calculate the porosity of the film.
申请公布号 AU5855799(A) 申请公布日期 2000.03.21
申请号 AU19990058557 申请日期 1999.08.27
申请人 INTERUNIVERSITAIRE MICROELEKTRONICA CENTRUM VZW;CENTRE FOR ADVANCED TECHNOLOGIES TECHNOKOM 发明人 MIKHAIL RODIONOVICH BAKLANOV;FEDOR NIKOLAEVICH DULTSEV;KONSTANTIN PETROVICH MOGILNIKOV;KAREN MAEX
分类号 G01B11/06;G01B11/14;G01N15/08;G01N21/00;G01N21/01;G01N21/21;G01N21/45 主分类号 G01B11/06
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