发明名称 |
Apparatus and method for determining porosity |
摘要 |
The present invention is related to an apparatus and a non-destructive method for determining the porosity of an element, particularly a thin film, formed on a substrate, said substrate being positioned in a pressurized chamber, said chamber being at a predetermined pressure and at a predetermined temperature. According to this method a gaseous substance like e.g. toluene vapor is admitted in said chamber and after a predetermined period of time the porosity of the thin film is determined by means of at least on ellipsometric measurement. Particularly, the optical characteristics resulting from this in-situ ellipsometry are used to determine the amount of gaseous substance condensed in the pores of the film. These amounts are used to calculate the porosity of the film. |
申请公布号 |
AU5855799(A) |
申请公布日期 |
2000.03.21 |
申请号 |
AU19990058557 |
申请日期 |
1999.08.27 |
申请人 |
INTERUNIVERSITAIRE MICROELEKTRONICA CENTRUM VZW;CENTRE FOR ADVANCED TECHNOLOGIES TECHNOKOM |
发明人 |
MIKHAIL RODIONOVICH BAKLANOV;FEDOR NIKOLAEVICH DULTSEV;KONSTANTIN PETROVICH MOGILNIKOV;KAREN MAEX |
分类号 |
G01B11/06;G01B11/14;G01N15/08;G01N21/00;G01N21/01;G01N21/21;G01N21/45 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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