| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing an optical disk adequate for high- density recording by forming the optical disk having the pit of a first depth and a second depth deeper than the first depth. SOLUTION: This process has a stage for forming a resist layer 42 consisting of a photoresist of a positive type at a uniform thickness on a glass substrate 40 subjected to polishing of its surface with high accuracy, a stage for forming apertures 44 at the resist layer 42 by executing development, a stage for dry etching the glass substrate 40 down to a first depth, a stage for selectively etching only the resist layer 42 by a method different from the dry etching and a stage for again dry etching the glass substrate 40 down to the second depth deeper than the first depth and a stage for removing the resist layer 42. |
