SUBSTRATE TREATING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide substrate treating equipment which makes substrates to be carried in a treating unit having a function of removing applied films from the peripheral edge sections of the substrates by accurately positioning the substrates. SOLUTION: A substrate transferring equipment 30 is provided with a nonsuction type transferring arm 31 and a vacuum-suction type transferring arm 32 and a cleaning plate CP1 is provided with a positioning mechanism 45. The nonsuction type transferring arm 31 of the device 30 transfers substrates W to the cleaning plate CP1 from a hot plate HP and the positioning mechanism 45 positions the substrates W. The vacuum-suction type transferring arm 32 of the device 30 transfers the substrates W to a rotary applying unit SC from the cleaning plate CP1. After a resist solution is applied to the substrates W in a rotary applying unit SC, edge rinsing is performed for removing resist films from the peripheral edge sections of the substrates W. Then the nonsuction type transferring arm 31 transfers the substrates W to the hot plate HP from the applying unit SC.