| 摘要 |
PROBLEM TO BE SOLVED: To easily produce a transparent conductive film having a low resistance. SOLUTION: In a water bubbling unit 20, water vapor is added to CF4 fed from a material gas supply source 16, and CF4 is introduced to an electric discharge unit 18. The discharge unit 18 generates gas discharge to cause reaction of CF4 and vapor, and a reactive fluorine gas is produced such as HF and COF2. The reactive fluorine gas is supplied to a fluoride treatment chamber 14 together with a dilute gas flowing into a treatment gas supply piping 40. An ITO thin film 44 laid in the chamber 14 is turned into fluoride by the reactive fluorine gas supplied to the chamber 14, and the resistance value is dropped.
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