| 摘要 |
PROBLEM TO BE SOLVED: To achieve improved controllability, productivity, and uniformity by forming a non-porous monocrystalline layer on the porous silicon layer of a first substrate after heat treatment in an oxygen atmosphere, laminating a second substrate to the side of the nonporous monocrystalline layer, then eliminating the first substrate, and performing heat treatment in a reducing atmosphere. SOLUTION: After a first substrate 11 with a porous silicon layer 15 is heat- treated in an oxygen atmosphere, a non-porous monocrystalline layer 12 is formed on the porous silicon layer 15. Then, a multilayer structure body is obtained, where the first substrate 12 and a second substrate 13 are laminated via an insulation layer and with the non-porous monocrystalline layer 12 inside. After that, the first substrate 11 (including the porous silicon layer 15) is eliminated from the multilayer structure body. Then, the non-porous monocrystalline layer 12 that is transferred onto the second substrate 13 via the insulation layer is heat-treated in a reducing atmosphere containing hydrogen and at a temperature of the melt point or less of the non-porous monocrystalline layer, thus achieving improved controllability, productivity, and uniformity.
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