发明名称 RADIATION SENSITIVE COMPOSITION FOR COLOR FILTER
摘要 PROBLEM TO BE SOLVED: To form a pixel array excellent in pattern shape and adhesive strength to a substrate in a high yield without leaving the undissolved matter (residue) of a composition in an unexposed part or generating scum on pixels by incorporating a specified compound. SOLUTION: The radiation sensitive composition contains a compound having a thermally reactive or photoreactive functional group and also having a functional group which is attracted on a colorant. The compound is preferably a phenyl-containing (meth)acrylic ester of formula I, wherein R1-R3 are each H, 1-10C alkyl, phenyl or the like R4 is H or methyl and R5 is a group of formula II or the like. In the formula II, R9 is H, hydroxyl or methyl, plural symbols R9 may be the same or different and (p) is an integer of 1-10.
申请公布号 JP2000081506(A) 申请公布日期 2000.03.21
申请号 JP19980250911 申请日期 1998.09.04
申请人 JSR CORP 发明人 NAGATSUKA TOMIO;SHIMADA SATORU;NEMOTO HIROAKI
分类号 G03F7/027;C08F290/04;C08L51/00;C09D4/06;C09D5/00;G02B5/20 主分类号 G03F7/027
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