发明名称 |
Ultra-high vacuum apparatus and method for high productivity physical vapor deposition. |
摘要 |
A magnetron sputtering system is provided that uses a backing plate assembly having an insulating spacer ring coupled between and hermetically sealed to the backing plate and an extender ring. The insulating spacer ring can be constructed from a ceramic material, and the extender ring can be constructed from a metal material. The use of this backing plate assembly allows the backing plate assembly to be coupled directly to the chamber walls with a metal-to-metal contact, while the backing plate remains electrically isolated from the chamber walls. This allows the sealing of a vacuum chamber in the magnetron sputtering system using a seal suitable for creating an ultra-high vacuum in the vacuum chamber.
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申请公布号 |
US6039848(A) |
申请公布日期 |
2000.03.21 |
申请号 |
US19970958877 |
申请日期 |
1997.10.27 |
申请人 |
CVC PRODUCTS, INC. |
发明人 |
MOSLEHI, MEHRDAD M.;DAVIS, CECIL J.;HEIMANSON, DORIAN |
分类号 |
C23C14/35;C23C14/56;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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