| 摘要 |
An off center three point carrier to be used in the wet processing of semiconductor substrates is provided. The carrier includes two side rails positioned in a spaced parallel relation by a plurality of supports. A third side rail is placed on the supports at an off center position relative to the first two side rails. The three spaced rails define a receiving region for one or more semiconductor substrates. By placing the third side rail in an off center position, etchants used in wafer processing will properly drain away from the semiconductor substrates when the carrier is removed from an etching bath. Thus, etchants are prevented from collecting within the rails of the carrier ensuring proper etching and drying of the semiconductor substrates.
|
