| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing system in which an optimal timing for supplementing original processing liquid can be determined, component ratio and volume of the processing liquid can be ensured stably and consumption of the processing liquid can be minimized. SOLUTION: The processing system 6 comprising a tank 30 storing APM processing liquid for water W is provided with a mechanism 40 for supplementing the storage tank 30 with ammonia aqueous solution, hydrogen peroxide water or pure water depending on the number of wafers W to be processed and the cleaning time. The processing system 6 is further provided with a circuit 31 for colleting the APM processing liquid into the storage tank 30 after processing the wafer W, a circuit 32 for regulating the state of the APM processing liquid, and a circuit 33 for supplying the APM processing liquid to the wafer W. A gas/liquid separation mechanism 52 is disposed in the way of the collecting circuit 31.
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