| 摘要 |
PROBLEM TO BE SOLVED: To provide a and apparatus for electronic part washing method capable of achieving a high purifying degree. SOLUTION: An electronic part washing apparatus equipped with a means supplying washing water 30 to an article 20 to be washed such as an AlTi wafer, a sponge like member 8 coming into contact with the article 20 to be washed to wash the surface thereof, a means relatively moving the article 20 to be washed and the sponge like member 8, and a means for setting the specific resistance value of washing water 30 to 10 MΩor less is used and, while the washing water 30 having a specific resistance value of 10 MΩor less is supplied to the article 20 to be washed, the article to be washed is washed by the sponge like member 8. In this case, by preliminarily immersing the article 20 to be washed in washing water having a specific resistance value of 10 MΩor less before washing, a further purifying degree is achieved by the use of a dummy substrate.
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