Halbleitende Emissionsvorrichtung mit schneller Wellenlängenmodulation

摘要

The separation of the electrodes (17, 18, 19) is obtained by reactive ion beam etching and chemical attack and deep etching produces a separation resistance of 2 kiloohm. Protons are introduced in the sides of the strip forming the active region (13, 14) and the absorbent region to reduce the current loss and the stray capacitance. Semi-insulating InP layers may be located either side of the strip. The absorbent region (16) comprises multiple quantum wells. It is controlled by an inverted voltage (-V) which almost instantaneously modifies the rate of absorption and the laser is polarised in such a way that there is a laser effect when the voltage is zero. Selective epitaxy on the surface is used to manufacture the absorption region.