| 摘要 |
<p>When forming color filters (for example, on solid state imagers or liquid crystal displays) using the process of US-A-4 808 901, in which a positive photoresist composition, containing a novolak resin, a diazo compound which sensitizes the resin to radiation, and a dye, is exposed and developed to form filter elements, very long exposure times are required when the dye obscures the radiation (typically 365 nm, mercury I-line radiation) used for exposure. By adding an acid generator, which generates acid upon exposure to the radiation used to expose the photoresist, exposure times can be substantially reduced without requiring the use of an amount of diazo compound which produces undesirable yellowing in the filter elements.</p> |
