发明名称 VERBESSERTES SYSTEM FÜR DIE MOTIVGENERIERUNG MITTELS EINES LASERS
摘要 A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection means (605-608) comprising a first beam splitting means (605) for creating an alignment beam from said radiant energy beam, a second beam splitting means (606) for creating a first positional beam and a second positional beam from said alignment beam, a first sensor (608) to detect the position of said radiant energy beam at said first point in space from said first positional beam, and a second sensor (607) to detect the position of said radiant energy beam at a second point in space from said second positional beam. <IMAGE>
申请公布号 DE69326079(T2) 申请公布日期 2000.03.16
申请号 DE1993626079T 申请日期 1993.10.22
申请人 ETEC SYSTEMS, INC. 发明人 ALLEN, PAUL;JOLLEY, MATTHEW;TEITZEL, ROBIN;RIEGER, MICHAEL;BOHAN, MICHAEL;THOMAS, TIMOTHY
分类号 G01D15/16;B23K26/04;B23K26/067;G02B26/12;G03F7/20;H01L21/027;H04N1/047;H04N1/113;H04N1/191;(IPC1-7):B41J2/435;H04N1/21 主分类号 G01D15/16
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