| 摘要 |
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating cone (52) which contains an assembly of light energy sources for emitting light energy onto a wafer (14). The heating cone (52) of the present invention includes a circular reflector (54) that can be conically-shaped. A plurality of lamps (26) are contained within the reflector. The light energy sources can be vertically oriented or can be tilted slightly towards the central axis of the heating cone. In this arrangement the heating cone produces a uniform irradiance distribution over a wafer (14) being heated on a rotating support. Preferably, the lamp powers are individually controlled by a controller (25) using signals from multiple temperature sensory (30).
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