| 发明名称 |
METHOD AND APPARATUS FOR MISTED LIQUID SOURCE DEPOSITION OF THIN FILMS WITH INCREASED YIELD |
| 摘要 |
PURPOSE: A method for misted liquid source deposition of thin films is provided to improve an yield without breaking down bonds of a liquid. CONSTITUTION: A mist generator (12) produces a mist from a liquid precursor. Energy is added to the mist particles without carbonizing or otherwise breaking down the bonds in the metal compounds and solvent, preferably by charging the mist particles and then electrically accelerating them. The mist is deposited on a substrate (605) having the opposite polarity to the particles. Infrared lamps (38, 40) may also heat the mist particles to a temperature below the temperature at which the compounds and solvent in the liquid precursor decompose.
|
| 申请公布号 |
KR20000015875(A) |
申请公布日期 |
2000.03.15 |
| 申请号 |
KR19987009425 |
申请日期 |
1998.11.21 |
| 申请人 |
SYMETRIX CO. |
发明人 |
MCMILLAN, LARRY, D.;PAZ D ARAUJO KARROS A. |
| 分类号 |
H01L21/314;B05D1/00;B05D1/04;C23C16/40;H01L21/316;H01L21/8242;H01L27/108;(IPC1-7):H01L21/314 |
主分类号 |
H01L21/314 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
