发明名称 APPARATUS AND METHOD FOR MEASURING DEFECT USING ROTATING STAGE
摘要 PURPOSE: The apparatus uses a rotating stage(16) to measure as setting differently through the stage rotating the position of the measured object to detect defect in different radiation angle. CONSTITUTION: The apparatus judges the defect more accurately by overlapping the measured data according to the angle setting the defect detection. The apparatus comprises: an irradiation part(20) radiating a light to the measured object placed on the stage in a fixed angle of fixed direction; a detecting part(22) detecting and analyzing the light reflected after being irradiated from the irradiation part; and a motor(12, 14) which moves the stage horizontally and vertically, and which rotates the stage so that the light irradiated to the same measuring point of the measured object is irradiated from different direction.
申请公布号 KR20000014876(A) 申请公布日期 2000.03.15
申请号 KR19980034494 申请日期 1998.08.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, YOUNG HO
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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