发明名称 Plasma jet chemical vapor deposition system having a plurality of distribution heads
摘要 <p>An arc jet CVD system (10) includes a plurality of plasma jet distribution heads (18). The distribution heads (18) are preferably linearly arranged, preferably angled relative to a line normal to the substrate surface on which a diamond film is being coated, and preferably spaced relatively apart with respect to a defined profile width. In addition, the plasma jets are preferably configured in accord with a defined parameter which is a function of the reagent gas flow and viscosity, the distance between the distribution heads (18) and the substrate (32), and the area on the substrate exposed to the gas from a distribution head (18). Configuring the plasma in accordance with the defined parameter-ensures an acceptable minimum level of efficiency with respect to hydrogen reagent use, and further provides a relatively uniform diamond film coating on a substrate. &lt;IMAGE&gt;</p>
申请公布号 EP0985742(A2) 申请公布日期 2000.03.15
申请号 EP19990117804 申请日期 1999.09.09
申请人 SAINT-GOBAIN INDUSTRIAL CERAMICS, INC. 发明人 SIMPSON, MATHEW A.
分类号 C23C16/513;C23C16/27;C23C16/44;C23C16/455;C23C16/54;H01J37/32;H05H1/44;(IPC1-7):C23C16/50;C23C16/26 主分类号 C23C16/513
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