发明名称 FERROELECTRIC MEMORY CAPACITOR AND FORMING METHOD THEREOF
摘要 PURPOSE: A ferroelectric memory capacitor and forming method thereof are provided to compensate a negative electric charge reduced according to oxygen vacancy. CONSTITUTION: The capacitor comprises a lower electrode, a ferroelectric layer formed on the lower electrode and an upper electrode formed on the ferroelectric layer. A first doping layer is formed between the lower electrode and the ferroelectric layer and having an atom to compensate a negative electric charge according to oxygen vacancy generated in the ferroelectric layer. A second doping layer is formed between the ferroelectric layer and the upper layer and having an atom to compensate a negative electric charge according to oxygen vacancy generated in the ferroelectric layer.
申请公布号 KR20000014388(A) 申请公布日期 2000.03.15
申请号 KR19980033792 申请日期 1998.08.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JO, HARK JOO;LEE, BOK JA
分类号 H01L27/04;(IPC1-7):H01L27/04 主分类号 H01L27/04
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