| 摘要 |
<p>A process for curing a resist in which a resist is cured quickly and with high efficiency without gas, which is formed by irradiation with electron beams with which the resist is irradiated for curing, remaining in it and thereby increase its thermostability, is achieved by the following process steps: a first, the resist is irradiated with electron beams and kept at a temperature such that gas is produced and released in the resist, but no gas bubbles are formed in the resist; second, the resist is heated so that the gas produced in the first process step is dissipated to the outside from the resist; and third, the resist is irradiated with electron beams so that macromolecules are formed in the resist and the resist is cured. <IMAGE></p> |
