AUTOMATIC CLEANING APPARATUS FOR SEMICONDUCTOR DEVICES

摘要

PURPOSE: An automatic cleaning apparatus is provided to improve a facility of observation inside of chamber and saving time and cleaning solution by using a spray cleaner formed at a transparent door. CONSTITUTION: The automatic cleaning apparatus comprises: a chamber(2) include of multi-bath for contained to cleaning solution; a loader(7) for loading or unloading into the water-bath(3); pipe for ventilation of cleaning solution fume; spray-cleaner(9) for transparent door cleaning; and a controller(13) for spray-cleaner, thereby improve a facility of observation inside of chamber and save the time and cleaning solution.