METHOD FOR SURFACE-TREATING ROBOT ARM HOLDER OF DRY ETCHING EQUIPMENT FOR SEMICONDUCTOR MANUFACTURE

摘要

PURPOSE: A method for surface-treating robot arm holder of dry etching equipment for semiconductor manufacture is provided to prevent friction scratching on the semiconductor wafer by coating Teflon on the surface of the robot arm holder made of metal. CONSTITUTION: The method comprises the steps of; a first degreasing of the arm holder surface to remove foreign matters off; a first surface treating to scratch the surface with emery powder for maximum adhesion of coating; a second degreasing of the holder surface to water-cleanse emery powder and other matters off with an ultrasonic washer to dry with air; a first Teflon coating to be baked at 380-400°C; the Teflon film coating to be baked at 390°C.