APPARATUS FOR CLEANING OF SEMICONDUCTOR WAFER,申请号KR19920023811-传众专利搜索

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发明名称	APPARATUS FOR CLEANING OF SEMICONDUCTOR WAFER
摘要
申请公布号	KR100247907(B1)	申请公布日期	2000.03.15
申请号	KR19920023811	申请日期	1992.12.10
申请人	SAMSUNG ELECTRONICS CO, LTD.	发明人	PARK, TAE-HOON;AHN, SEONG-GYOO
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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