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发明名称
COATING APPARATUS OF PHOTORESIST USED IN MANUFACTURING SEMICONDUCTOR
摘要
申请公布号
KR100249309(B1)
申请公布日期
2000.03.15
申请号
KR19970006793
申请日期
1997.02.28
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
PARK, SUNG HYEON;KIM, SUNG IL
分类号
B05B15/02;B05C11/08;G03F7/16;H01L21/027;(IPC1-7):H01L21/027
主分类号
B05B15/02
代理机构
代理人
主权项
地址
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