发明名称 |
Yttrium tantalate x-ray phosphors with reduced persistence |
摘要 |
<p>A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a molybdenum or vanadium additive into the phosphor. The method for incorporating the molybdenum or vanadium additive consists of adding a molybdenum or vanadium containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.</p> |
申请公布号 |
EP0985720(A1) |
申请公布日期 |
2000.03.15 |
申请号 |
EP19990117890 |
申请日期 |
1999.09.10 |
申请人 |
OSRAM SYLVANIA INC. |
发明人 |
MARKING, GREGORY A.;REDDY, VADDI BUTCHI |
分类号 |
C09K11/08;C09K11/77;C09K11/78;C09K11/80;H05B33/12;H05B33/14;(IPC1-7):C09K11/78;C09K11/82 |
主分类号 |
C09K11/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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