发明名称 Yttrium tantalate x-ray phosphors with reduced persistence
摘要 <p>A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a molybdenum or vanadium additive into the phosphor. The method for incorporating the molybdenum or vanadium additive consists of adding a molybdenum or vanadium containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.</p>
申请公布号 EP0985720(A1) 申请公布日期 2000.03.15
申请号 EP19990117890 申请日期 1999.09.10
申请人 OSRAM SYLVANIA INC. 发明人 MARKING, GREGORY A.;REDDY, VADDI BUTCHI
分类号 C09K11/08;C09K11/77;C09K11/78;C09K11/80;H05B33/12;H05B33/14;(IPC1-7):C09K11/78;C09K11/82 主分类号 C09K11/08
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