| 摘要 |
PURPOSE: Provided is a radiation sensitive material for excimer laser lithography, which has excellent transparency, adhesion, etching resistance and sensitivity and permits stable patterning of a resist containing a strongly hydrophobic group. CONSTITUTION: The radiation sensitive material comprises: a terpolymer represented by the formula; and a substance generating an acid upon irradiation with radiation. In the formula, o is 10-90 mol%; p is 1-89 mol% and q is 1-89 mol%; X represents H or CH3; Y represents tert-butoxy; and R represents equation(wherein each of R1 and R2 represents H and R3 represents phenyl; R1 represents CH3, R2 represents H and R3 represents phenyl or cyclopropenyl; each of R1 and R2 represents CH3 and R3 represents phenyl or cyclopropenyl; or each of R1, R2 and R3 represents CH3). |
