| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of projection exposure and a projection aligner with a stable focus image which has a large depth of focus by compensating distortion in an image face, that is changed in each illumination mode shifted by an illumination-light deforming means or a distortion of the image face caused by an exposure environment or exposure history. SOLUTION: A reticle is illuminated by an illuminating system, and a pattern is formed on the reticle. Then, the pattern is transcribed by exposure on a photosensitive substrate by a projection optical system. In this case, when the distribution of the strength of light on a pupil face in the projection optical system is changed by an illumination-light deforming means, the reticle is deformed for each deformed state of illumination light through a reticle deforming means to compensate the distortion of the image face of the transcribed pattern.
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