| 摘要 |
The method includes patterning red, green and blue pixels (R, G, B) on a substrate. A transparent positive type photoresist is coated on the color pixels. A first exposure is performed by an illumination using a photomask having an opening aligned to the red pixels (R). Next, the photomask is relatively shift to a position such that the opening is aligned to the green pixels (g). Then, a second exposure is carried out to expose the positive photoresist. Similarly, the photomask is also shift such that the opening is aligned to the blue pixels. Subsequently, the positive photoresist is exposed by the illumination by using the photomask. The positive photoresist is exposed by controlling the intensity of the illumination, exposure time or the combination thereof. Then, the positive photoresist is developed by conventional manner. Subsequently, a color filter plate with multi-gap for LCD is formed.
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