发明名称 POLISHING CLOTH AND METHOD FOR ATTACHING/DETACHING POLISHING CLOTH TO/FROM TURN TABLE OF POLISHING MACHINE
摘要 PROBLEM TO BE SOLVED: To provide a polishing cloth and a method for attaching the cloth to and detaching from a turn table that can be readily removed from the turn table surface only by heating the adhesive layer of the turn table and the polishing cloth when exchanging the polishing cloth. SOLUTION: This polishing cloth has a polishing cloth substrate 5, a pressure sensitive adhesive layer 3 laminated on one surface of the polishing cloth substrate 5 and a release sheet 4 releasably adhered on the pressure sensitive adhesive layer 3. The adhesive composition forming the pressure sensitive adhesive layer 3 contains a pressure sensitive adhesive and a polymer, with 1 to 30 weight% of the adhesive composition, that can be crystalizable with side-chain. The polymer that can be crystalizable with side-chain is a polymer with a molecular weight of 10,000 or less having as main components acrylic ester and/or ester methacrylate containing a linear alkyl group having not less than 16 carbon atoms as side chain. This polymer also has a melting point within a temperature range narrower than 15 deg.C.
申请公布号 JP2000077366(A) 申请公布日期 2000.03.14
申请号 JP19980244105 申请日期 1998.08.28
申请人 NITTA IND CORP 发明人 KAWAHARA SHINICHIRO;KASAZAKI TOSHIAKI;TANI NAOYUKI;ANDO TAKUJI;YAMAMOTO MASAYOSHI
分类号 B24D11/00;B24B37/20;B24B37/22;B24B37/24;B24D3/00;B24D13/20;C09J7/02;H01L21/304 主分类号 B24D11/00
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