| 摘要 |
PROBLEM TO BE SOLVED: To achieve replacement of treatment liquid within a processing vessel smoothly and besides in a short time. SOLUTION: This substrate processor is provided with a treatment liquid supply pipe 2 at the specified position close to the bottom of a processing vessel 2, and also is provided with a current plate 3 a little upward of the treatment liquid supply pipe 2, and a support 5 is coupled integrally with the topside of the hem of this current plate 3 by welding or the like, and the top of this support 5 is turned down, and the specified position of this turn 5a is coupled with the specified position of the outside of the processing vessel 1 by bolts or the like, whereby the top of the support 5 is positioned above the topside of the processing vessel 1. Furthermore, the body of the support 5 is separated by a specified distance (the specified distance capable of tolerate the smooth flow of treatment liquid) from the inside of the processing vessel 1.
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