发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To process the whole surface of a substrate favorably. SOLUTION: The introduction ports 30 of exhaust and drain passages 3 for exhaust and drainage are arranged at a specified interval apart at the sides of a substrate W retained by a retaining member 13, and a base member 12 and an upper screen member 2, which are provided further with extension parts EP1 and EP2 having specified lengths around the opposition parts TP1 and TP2 opposed to the top and bottom of the substrate W and in which the peripheries of the extension parts EP1 and EP2 are arranged in the vicinity of the introduction parts 30 of the exhaust and drain passages 3 in condition that they are arranged close to the top and bottom of the substrate W, are arranged severally close to the top and bottom of the substrate W retained by the retaining member 13. Specified processing is performed while rotating the substrate W retained by the retaining member 13, the base member 12, and the upper screen member 2 by driving electric motors 10 and 22.
申请公布号 JP2000077378(A) 申请公布日期 2000.03.14
申请号 JP19980241655 申请日期 1998.08.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAMIYAMA TSUTOMU
分类号 B08B3/04;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/04
代理机构 代理人
主权项
地址