| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a fine pattern in wet etching. SOLUTION: A manufacturing method is at least provided with a process that forms a negative first resist film 3 on a thin film, a process that forms a positive second resist film 4 on the first resist film, a process that uses a mask with a specific pattern and exposes the second resist film, a process that develops the second resist film and eliminates a non-exposed part, a process that uses the remaining part of the second resist film as the mask (M1) with a specific pattern and eliminates the first resist film, and a process that uses the lamination body of the first and second resist films as a mask (M2) with a specific wiring pattern and etches the thin film.</p> |
