发明名称 Field effect transistors, integrated circuitry, methods of forming field effect transistor gates, and methods of forming integrated circuitry
摘要 A field effect transistor includes a pair of source/drain regions having a channel region positioned therebetween. A gate is positioned operatively proximate the channel region. The gate includes semiconductive material conductivity doped with at least one of a p-type or n-type conductivity enhancing impurity effective to render the semiconductive material electrically conductive, a silcide layer and a conductive diffusion barrier layer effective to restrict diffusion of p-type or n-type conductivity enhancing impurity. The conductive diffusion barrier layer includes TiW<SUB>x</SUB>N<SUB>y</SUB>. Integrated circuitry is also disclosed.
申请公布号 AU5682399(A) 申请公布日期 2000.03.14
申请号 AU19990056823 申请日期 1999.08.17
申请人 MICRON TECHNOLOGY, INC. 发明人 CHARLES H DENNISON
分类号 H01L21/28;H01L21/768;H01L23/485;H01L29/423;H01L29/43;H01L29/49;H01L29/78 主分类号 H01L21/28
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