| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner capable of realizing consecutive exposure. SOLUTION: A cylindrical photomask 1 is rotated, and a work W is carried in synchronization with the rotation of the photomask 1 and exposed at an exposing position E by an exposing light source 2 provided in the photomask 1. The pattern pitch of a film mask 10 is previously measured and the rotation of a cylindrical body 11 is controlled in according with the pattern pitch.
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