发明名称 Method of making a contact structure
摘要 Electrical shorts and leakage paths are virtually eliminated by recessing conductive nodules (52) away from a conductor (72) or not forming the conductive nodules at all. In one embodiment, the refractory metal containing material (52) is recessed from the edge of the opening (32). When forming a nitride layer (54) within the opening (32), conductive nodules (52) are formed from a portion of the refractory metal containing material (20) such that the conductive modules (52) lie within the recession (42). In another embodiment, an oxide layer (82, 102) is formed adjacent to the refractory metal containing material (20) before forming a nitride layer (84, 112).
申请公布号 US6037246(A) 申请公布日期 2000.03.14
申请号 US19960715303 申请日期 1996.09.17
申请人 MOTOROLA INC. 发明人 BHAT, MOUSUMI;HALL, MARK D.;SITARAM, ARKALGUD R.;WOO, MICHAEL P.
分类号 H01L21/768;(IPC1-7):H01L21/476 主分类号 H01L21/768
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