| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing tank of an apparatus for processing a photosensitive material capable of preventing contamination caused by mixing a processing solution, which flows up by capillary phenomena and surface tension along swirl marks on the surface of the partitioning walls of the processing tank made of a synthetic resin and formed by molding, together with the neighboring processing solution without using a harmful solvent dangerous in handling. SOLUTION: The processing tank of the apparatus for processing the photosensitive material is partitioned with partitioning walls into plural processing vessels by molding them in one body to form a foamed resin mold, and the processing tank is formed by adding 0.5-5.0 pts.wt. of a silicone oil to 100 pts.wt. of the resin and to form a foamed resin extrusion product and to reduce the surface tension of the molded surfaces having the swirl marks.
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