发明名称 |
Carrier head with layer of conformable material for a chemical mechanical polishing system |
摘要 |
A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture detachably connected to a backing fixture, a retaining ring connected directly to the conformable material, and a shield ring which projects over a portion of the layer of conformable material.
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申请公布号 |
US6036587(A) |
申请公布日期 |
2000.03.14 |
申请号 |
US19960728688 |
申请日期 |
1996.10.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
TOLLES, ROBERT D.;CHENG, TSUNGAN;PRINCE, JOHN |
分类号 |
B24B37/04;(IPC1-7):B24B7/22 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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