| 摘要 |
PROBLEM TO BE SOLVED: To keep a multilayer structure in an airtight state over a long period of time, by forming a sealing film, by a plasma CVD method using silane gas and nitrogen gas, on the multilayer structure comprising a positive electrode, a plurality of organic compound layers, and a negative electrode, provided on a glass substrate. SOLUTION: A positive electrode 2 comprising a transparent electrode of ITO etc., is formed by deposition on a transparent glass substrate 1, and on this, a hole injection layer 3 of copper phthalocyanine etc., a hole transfer layer 4 of a triphenylamine derivative etc., a luminous layer 5 of an aluminum chelate complex etc., an electron injection layer 6 of LiO2 etc., and a negative electrode 7 of Al etc., are deposited in this order, to form a multilayer structure 8. Then, a sealing film 9 made of SiNx is formed on the multilayer structure 8, and thus an airtightly sealed organic electroluminescent element is obtained. The sealing film 9 is formed by a plasma CVD method using a raw-material gas comprising only SiH4 gas and N2 gas. Because residual stresses are small in the plane directions, the sealing film causes no cracking or peeling, and stabilizes the luminescence of the element for a long period of time. |
